Surface characterization of nickel alloy plasma-treated by O2/CF4 mixture

被引：0
|
作者：
机构：
[1] Chan-Park, Mary B.
[2] Gao, Jianxia
[3] Koo, Arthur H.L.
来源：
Chan-Park, M.B. (mbechan@ntu.edu.sg) | 1979年 / VSP BV卷 / 17期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Surface characterization of nickel alloy plasma-treated by O2/CF4 mixture
    Chan-Park, MB
    Gao, JX
    Koo, AHL
    JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 2003, 17 (15) : 1979 - 2004
  • [2] Surface characterization of nickel alloy plasma-treated by O 2/CF4 mixture
    Chan-Park, M.B., 1979, Taylor and Francis Ltd. (17):
  • [3] Enhanced field emission from O2 and CF4 plasma-treated CuO nanowires
    Zhu, YW
    Moo, AM
    Yu, T
    Xu, XJ
    Gao, XY
    Liu, YJ
    Lim, CT
    Shen, ZX
    Ong, CK
    Wee, ATS
    Thong, JTL
    Sow, CH
    CHEMICAL PHYSICS LETTERS, 2006, 419 (4-6) : 458 - 463
  • [4] On the Control of Plasma Parameters and Active Species Kinetics in CF4 + O2 + Ar Gas Mixture by CF4/O2 and O2/Ar Mixing Ratios
    Efremov, Alexander
    Lee, Junmyung
    Kim, Jihun
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2017, 37 (05) : 1445 - 1462
  • [5] Plasma parameters and active species kinetics in CF4/O2/Ar gas mixture: Effects of CF4/O2 and O2/Ar mixing ratios
    Lee, Junmyung
    Kwon, Kwang-Ho
    Efremov, A.
    INTERNATIONAL CONFERENCE ON MICRO- AND NANO-ELECTRONICS 2016, 2016, 10224
  • [6] On the Control of Plasma Parameters and Active Species Kinetics in CF4 + O2 + Ar Gas Mixture by CF4/O2 and O2/Ar Mixing Ratios
    Alexander Efremov
    Junmyung Lee
    Jihun Kim
    Plasma Chemistry and Plasma Processing, 2017, 37 : 1445 - 1462
  • [7] ON THE APPLICATION OF XPS, SSIMS AND QCM TO STUDY THE SURFACE OF A CF4/O2 PLASMA TREATED POLYCARBONATE
    OCCHIELLO, E
    MORRA, M
    GARBASSI, F
    BARGON, J
    APPLIED SURFACE SCIENCE, 1989, 36 (1-4) : 285 - 295
  • [8] Etching of PES fabric by O2/CF4 plasma
    Aubrecht, L.
    Pichal, J.
    Spatenka, P.
    Vatuna, T.
    Martinkova, L.
    CZECHOSLOVAK JOURNAL OF PHYSICS, 2006, 56 : B1126 - B1131
  • [9] Surface Analysis of Chamber Coating Materials Exposed to CF4/O2 Plasma
    Park, Seung Hyun
    Kim, Kyung Eon
    Hong, Sang Jeen
    COATINGS, 2021, 11 (01) : 1 - 11
  • [10] Characterization and electrochemical properties of CF4 plasma-treated boron-doped diamond surfaces
    Kondo, Takeshi
    Ito, Hiroyuki
    Kusakabe, Kazuhide
    Ohkawa, Kazuhiro
    Honda, Kensuke
    Einaga, Yasuaki
    Fujishima, Akira
    Kawai, Takeshi
    DIAMOND AND RELATED MATERIALS, 2008, 17 (01) : 48 - 54
12345