Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet

被引：0

作者：

Slaughter, J.M. ^{[1
]}

Schulze, Dean W. ^{[1
]}

Hills, C.R. ^{[1
]}

Mirone, A. ^{[1
]}

Stalio, R. ^{[1
]}

Watts, R.N. ^{[1
]}

Tarrio, C. ^{[1
]}

Lucatorto, T.B. ^{[1
]}

Krumrey, M. ^{[1
]}

Mueller, P. ^{[1
]}

Falco, Charles M. ^{[1
]}

机构：

[1] Univ of Arizona, Tucson, United States

来源：

Journal of Applied Physics | 1994年 / 76卷 / 04期

关键词：

Characterization - Composition - Interfaces (materials) - Molybdenum - Morphology - Silicon - Sputter deposition - Structure (composition) - Synchrotron radiation - Transmission electron microscopy - Ultraviolet radiation - X ray analysis;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

This study aims to compare multilayer made by sputtering and evaporation and to show how each of the structural and compositional parameters that describe a multilayer, affects the EUV reflectivity. To accomplish these goals, the rigorous characterization routine described here is necessary. Through the use of various deposition parameters, multilayers are made, and they are characterized with three types of x-ray diffraction, TEM, Rutherford backscattering spectrometry, and Auger depth profiling. Their performance was evaluated by measuring the EUV reflectivity as a function of wavelength using a synchrotron-radiation source.

引用

页码：2144 / 2156

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