DIFFUSION AT METAL/AMORPHOUS SiO2 INTERFACE.

被引：0

作者：

Kanameda, Yasumasa ^{[1
]}

Nagata, Kazuhiro ^{[1
]}

Goto, Kazuhiro S. ^{[1
]}

机构：

[1] Diesel Instrument Co, Higashimatsuyana, Jpn, Diesel Instrument Co, Higashimatsuyana, Jpn

来源：

| 1986年 / 27期

关键词：

OXIDES; -; Diffusion;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Amorphous SiO//2(a-SiO//2) was joined with Ni, Fe, Co or Cu by heating. The distribution of elements near the interface were measured in order to investigate the mechanism of joining. The diffusion of metal oxide in a-SiO//2 is caused by atomic defects. The diffusion coefficient is estimated to be 10** minus **1**7 m**2/s. That of NiO in a-SiO//2 is approximately proportional to Po//2**1**/**4.

引用

共 50 条

[21] Electrostatics at the pentacene-SiO2 interface.
Chen, LW
Ludeke, R
Schrott, A
Kagan, CR
Brus, LE
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2003, 226 : U429 - U429
[22] Effects of interface bonding and defects on boron diffusion at Si/SiO2 interface
Kim, Geun-Myeong
Oh, Young Jun
Chang, K. J.
JOURNAL OF APPLIED PHYSICS, 2013, 114 (22)
[23] Atomistic modeling of strain and diffusion at the Si/SiO2 interface
Ganster, Patrick
Treglia, Guy
Saul, Andres
PHYSICAL REVIEW B, 2010, 81 (04):
[24] Interface conductance modal analysis of a crystalline Si-amorphous SiO2 interface
Gordiz, Kiarash
Muraleedharan, Murali Gopal
Henry, Asegun
JOURNAL OF APPLIED PHYSICS, 2019, 125 (13)
[25] Effect of the Si/SiO2 interface on self-diffusion of Si in semiconductor-grade SiO2
Fukatsu, S
Takahashi, T
Itoh, KM
Uematsu, M
Fujiwara, A
Kageshima, H
Takahashi, Y
Shiraishi, K
Gösele, U
APPLIED PHYSICS LETTERS, 2003, 83 (19) : 3897 - 3899
[26] Diffusion and reactions of interstitial oxygen species in amorphous SiO2:: A review
Kajihara, Koichi
Miura, Taisuke
Kamioka, Hayato
Aiba, Akira
Urarnoto, Motoko
Morinioto, Yukihiro
Hirano, Masahiro
Skuja, Linards
Hosono, Hideo
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (2-9) : 224 - 232
[27] Diffusion of oxygen molecules in fluorine-doped amorphous SiO2
Kajihara, Koichi
Miura, Taisuke
Kamioka, Hayato
Hirano, Masahiro
Skuja, Linards
Hosono, Hideo
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2010, 173 (1-3): : 158 - 161
[28] O-18 DIFFUSION THROUGH AMORPHOUS SIO2 AND CRISTOBALITE
RODRIGUEZVIEJO, J
SIBIEUDE, F
CLAVAGUERAMORA, MT
MONTY, C
APPLIED PHYSICS LETTERS, 1993, 63 (14) : 1906 - 1908
[29] Oxygen diffusion through Al-doped amorphous SiO2
Yiguang Wang
Yongho Sohn
Linan An
Yi Fan
Ligong Zhang
Journal of Phase Equilibria and Diffusion, 2006, 27 (6) : 671 - 675
[30] Oxygen diffusion through Al-doped amorphous SiO2
Wang, Yiguang
Sohn, Yongho
Fan, Yi
Zhang, Ligong
An, Linan
JOURNAL OF PHASE EQUILIBRIA AND DIFFUSION, 2006, 27 (06) : 671 - 675

← 1 2 3 4 5 →