Molecular simulation of film growth rate in the low-pressure CVD method. (Two-dimensional horizontal reactor)

被引:0
|
作者
Nanbu, Kenichi
Igarashi, Saburo
Watanabe, Yasuo
机构
关键词
Test-Particle Monte Carlo Method;
D O I
10.1299/kikaib.56.892
中图分类号
学科分类号
摘要
引用
下载
收藏
页码:892 / 897
相关论文
共 50 条
  • [1] THIN-FILM PREPARATION BY PLASMA AND LOW-PRESSURE CVD IN A HORIZONTAL REACTOR
    MOROSANU, CE
    SOLTUZ, V
    VACUUM, 1981, 31 (07) : 309 - 313
  • [2] POLYSILICON GROWTH KINETICS IN A LOW-PRESSURE CVD REACTOR
    HITCHMAN, ML
    KANE, J
    WIDMER, AE
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (08) : C356 - C356
  • [3] Simulation of growth rate variation of CVD-Mo film along axial direction in horizontal tubular reactor
    Yoshikawa, N
    Kikuchi, A
    MATERIALS TRANSACTIONS JIM, 1997, 38 (04): : 299 - 305
  • [4] GROWTH OF TUNGSTEN SILICIDE FILMS BY LOW-PRESSURE CVD METHOD
    CHEN, JR
    FANG, YK
    HSU, SL
    VACUUM, 1987, 37 (3-4) : 357 - 361
  • [5] Simulation of two-dimensional thin film growth by modified DLA method
    Xie, GF
    Wang, DW
    Ying, CT
    ACTA PHYSICA SINICA, 2005, 54 (05) : 2212 - 2219
  • [6] A two-dimensional molecular dynamics simulation of thin film growth by oblique deposition
    Dong, L
    Smith, RW
    Srolovitz, DJ
    JOURNAL OF APPLIED PHYSICS, 1996, 80 (10) : 5682 - 5690
  • [8] ON THE SI-CARBIDE FILM BY LOW-PRESSURE PLASMA ENHANCED CVD METHOD
    HAYASHI, H
    JOURNAL OF ELECTRON MICROSCOPY, 1984, 33 (03): : 320 - 320
  • [9] Two-dimensional simulation of ion energy and angular distributions at the wafer in low-pressure RF discharges
    Hu, Y.
    Lin, T.L.
    Huang, C.Y.
    IEEE International Conference on Plasma Science, 2000,
  • [10] Two-dimensional plasma density distributions in low-pressure gas discharges
    Berlin, EV
    Dvinin, SA
    Mikheev, VV
    Omarov, MO
    Sviridkina, VS
    PLASMA PHYSICS REPORTS, 2004, 30 (12) : 1043 - 1051