Reducing the effects of aberrations with phase-shift masks and optimized resists

被引：0
|
作者：
Schenker, Richard [1 ]
机构：
[1] Intel Corp, Hillsboro, United States
来源：
Microlithography World | 2000年 / 9卷 / 02期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Masks
引用
收藏
相关论文
共 50 条
  • [31] CALCULATIONS OF PHASE-SHIFT AND REFLECTIVITY FOR PHASE-SHIFTING MASKS EMPLOYING MULTILAYER FILMS
    CHIEU, TC
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (11): : 3584 - 3588
  • [32] Detection and repair of multiphase defects on alternating phase-shift masks for DUV lithography
    Nagashige, S
    Hayashi, K
    Akima, S
    Takahashi, H
    Chiba, K
    Yamada, Y
    Matsuzawa, Y
    19TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 1999, 3873 : 127 - 137
  • [33] ZrSiO, a new and robust material for attenuated phase-shift masks in ArF lithography
    Onodera, T
    Matsuo, T
    Nakazawa, K
    Miyazaki, J
    Ogawa, T
    Morimoto, H
    Haraguchi, T
    Fukuhara, N
    Matsuo, T
    Otaki, M
    Takeuchi, S
    19TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 1999, 3873 : 337 - 343
  • [34] REDUCING PHASE-SHIFT IN CARRIER-TYPE ANALOGUE MULTIPLIERS
    NAYLOR, JB
    TOWNSEND, JM
    ELECTRONIC ENGINEERING, 1971, 43 (518): : 38 - &
  • [35] New advancements in focused ion beam repair of alternating phase-shift masks
    Lessing, J
    Robinson, T
    Brannen, R
    Morrison, T
    Holtermann, T
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY X, 2003, 5130 : 496 - 509
  • [36] Wavelength dependent spot defects on advanced embedded attenuated phase-shift masks
    Magg, C
    Benz, J
    Kindt, L
    Smith, A
    Burnham, J
    Riendeau, J
    Johnson, C
    Kontra, R
    24TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PT 1 AND 2, 2004, 5567 : 72 - 80
  • [37] Repair of phase-shift masks using low energy focused ion beams
    lee, Hsiaowen, 1600, (31):
  • [38] Inspection capability of chromeless phase-shift masks for the 90nm node
    Taylor, D
    22ND ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4889 : 1018 - 1022
  • [39] Proximity effects of alternating Phase Shift Masks
    Maurer, W
    Friedrich, C
    Mader, L
    Thiele, J
    19TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 1999, 3873 : 344 - 349
  • [40] Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks
    Tejnil, E
    Stivers, AR
    Schenker, RS
    Zurbrick, LS
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VII, 2000, 4066 : 376 - 387
12345