METHODS OF CREATION AND EFFECT OF MICROWAVE PLASMAS UPON THE ETCHING OF POLYMERS AND SILICON.

被引：25
|
作者：
Paraszczak, J. [1 ]
Heidenreich, J. [1 ]
Hatzakis, M. [1 ]
Moisan, M. [1 ]
机构：
[1] IBM, Yorktown Heights, NY, USA, IBM, Yorktown Heights, NY, USA
来源：
Microelectronic Engineering | 1985年 / 3卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(85)90050-4
中图分类号：
学科分类号：
摘要：
INTEGRATED CIRCUIT MANUFACTURE
引用
收藏
页码：397 / 410
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