CHARACTERIZATION OF PLASMA-DEPOSITED SILICON NITRIDE FILMS BY AUGER ELECTRON SPECTROSCOPY AND ELECTRON ENERGY LOSS SPECTROSCOPY.

被引：0
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作者：
Hezel, R. [1 ]
Lieske, N. [1 ]
机构：
[1] Institut für Werkstoffwissenschaften VI, Universität Erlangen-Nürnberg, D-8520 Erlangen, Germany
来源：
| 1671年 / 53期
关键词：
SPECTROSCOPY; -; AUGER ELECTRON;
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