CHARACTERIZATION OF PLASMA-DEPOSITED SILICON NITRIDE FILMS BY AUGER ELECTRON SPECTROSCOPY AND ELECTRON ENERGY LOSS SPECTROSCOPY.

被引：0

作者：

Hezel, R. ^{[1
]}

Lieske, N. ^{[1
]}

机构：

[1] Institut für Werkstoffwissenschaften VI, Universität Erlangen-Nürnberg, D-8520 Erlangen, Germany

来源：

| 1671年 / 53期

关键词：

SPECTROSCOPY; -; AUGER ELECTRON;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

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