Plasma-assisted deposition and characterization of Ti-containing diamondlike carbon coatings

被引:0
|
作者
Meng, W.J.
Curtis, T.J.
Rehn, L.E.
Baldo, P.M.
机构
来源
Journal of Applied Physics | 1998年 / 83卷 / 11 pt 1期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF HARD COATINGS WITH METALLOORGANIC COMPOUNDS
    RIE, KT
    GEBAUER, A
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 (1-2): : 61 - 66
  • [32] THE APPLICATION OF HARD COATINGS PRODUCED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
    LI, SZ
    ZHAO, C
    XU, X
    SHI, YL
    YANG, HS
    XIE, Y
    HUANG, W
    SURFACE & COATINGS TECHNOLOGY, 1990, 43-4 (1-3): : 1007 - 1014
  • [33] TRIBOLOGICAL BEHAVIOR OF HARD CARBON COATINGS DEPOSITED ON STEEL SUBSTRATES BY PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION
    LEHUU, T
    NERY, H
    ZAIDI, H
    PAULMIER, D
    DIAMOND AND RELATED MATERIALS, 1994, 3 (07) : 1028 - 1033
  • [34] Deposition of Ti-containing diamond-like carbon films on interior surface of tubes by plasma source ion implantation
    Hatada, Ruriko
    Baba, Koumei
    Morimura, Takao
    Hasaka, Masayuki
    NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY, 2006, 16 (01): : 55 - 60
  • [35] Characterization of high temperature deposited Ti-containing hydrogenated carbon thin films
    Shi, B
    Meng, WJ
    Evans, RD
    JOURNAL OF APPLIED PHYSICS, 2004, 96 (12) : 7705 - 7713
  • [36] Deposition of Ti-containing diamond-like carbon (DLC) films by PECVD technique
    Caschera, D.
    Federici, F.
    Kaciulis, S.
    Pandolfi, L.
    Cusma, A.
    Padeletti, G.
    MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, 2007, 27 (5-8): : 1328 - 1330
  • [37] SYNTHESIS AND CHARACTERIZATION OF TI-CONTAINING MESOPOROUS SILICAS
    GONTIER, S
    TUEL, A
    ZEOLITES, 1995, 15 (07): : 601 - 610
  • [38] Plasma-assisted physical vapour deposition
    Mackowski, J.M., 1600, (44):
  • [39] PLASMA-ASSISTED DEPOSITION OF DIELECTRIC FILMS
    ADAMS, AC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C312 - C312
  • [40] PLASMA-ASSISTED DEPOSITION AND EPITAXY OF ZNSE
    SATO, H
    OSADA, O
    MATSUSHITA, K
    HARIU, T
    SHIBATA, Y
    VACUUM, 1986, 36 (1-3) : 133 - 137