Comprehensive study of lateral grain growth in poly-Si films by excimer laser annealing and its application to thin film transistors

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[1] Kuriyama, Hiroyuki
[2] Nohda, Tomoyuki
[3] Aya, Yoichirou
[4] Kuwahara, Takashi
[5] Wakisaka, Kenichiro
[6] Kiyama, Seiichi
[7] Tsuda, Shinya
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Kuriyama, Hiroyuki | 1600年 / JJAP, Minato-ku, Japan卷 / 33期
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Grain growth;
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