SYNTHESIS OF MON AND RUN BY ACTIVE NITROGEN SPUTTERING.

被引：0

作者：

Ihara, H. ^{[1
]}

Terada, N. ^{[1
]}

Senzaki, K. ^{[1
]}

Hirabayashi, M. ^{[1
]}

Kimura, Y. ^{[1
]}

Uzuka, R. ^{[1
]}

Kawashima, F. ^{[1
]}

Akimoto, M. ^{[1
]}

Kezuka, H. ^{[1
]}

机构：

[1] Electrotechnical Lab, Niihari-gun, Jpn, Electrotechnical Lab, Niihari-gun, Jpn

来源：

IEEE Transactions on Magnetics | 1986年 / MAG-23卷 / 02期

关键词：

MOLYBDENUM COMPOUNDS - Synthesis - RUBIDIUM COMPOUNDS - Synthesis;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

MoN films with B1 and hexagonal phases were prepared by active nitrogen sputtering. Films with high-superconducting transition temperatures (T//c 14 K) were synthesized using NO sputtering gas, which favors the production of active nitrogen atoms. The T//c of B1 and hexagonal mixed-phase films was higher than that of either of the single phase films. RuN//x films consisting of B1-like RuN and hexagonal Ru had T//c of 9. 1 K. High-pressure-annealed films attained the highest T//c 16. 4 K, of all the films in the MoN system for both B1 and hexagonal mixed-phase. The highest T//c for the Ru-N films (high-pressure-annealed) was 10. 1 K.

引用

共 50 条

[21] SURFACE BINDING ENERGY IN SLOW COLLISIONAL SPUTTERING.
Kelly, Roger
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1986, B18 (4-6) : 388 - 398
[22] MECHANISMS OF ATOMIC ION EMISSION DURING SPUTTERING.
Yu, Ming L.
Lang, Norton D.
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1985, B14 (4-6) : 403 - 413
[23] NEW TECHNIQUE FOR THE FORMATION OF ULTRAFINE PARTICLES BY SPUTTERING.
Yatsuya, Shigeki
Kamakura, Takanobu
Yamauchi, Kenji
Mihama, Kazuhiro
1600, (25):
[24] PASSIVATION OF ETCHED MIRROR LASER WITH ANGLED SPUTTERING.
Iga, Kenichi
Mori, Yoshihiro
Kotaki, Yuji
Bulletin of Research Laboratory of Precision Machinery and Electronics, 1986, (58): : 17 - 19
[25] Emission theory of amorphous-material sputtering. Energy dependence of the sputtering coefficient
Pustovit A.N.
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques, 2017, 11 (5) : 1069 - 1077
[26] PREPARATION OF TbFeCo FILMS BY TWO SOURCE MAGNETRON SPUTTERING.
Tanaka, M.
Ohmi, F.
Watada, A.
1984, (TJMJ-1):
[27] PREPARATION OF MAGNETIC GARNET FILMS BY ION BEAM SPUTTERING.
Okuda, T.
Hayashi, K.
Yokoyama, Y.
Koshizuka, N.
IEEE translation journal on magnetics in Japan, 1984, TJMJ-1 (01): : 71 - 72
[28] SURFACE DAMAGE AND TOPOGRAPHY CHANGES PRODUCED DURING SPUTTERING.
Nelson, R.S.
Mazey, D.J.
1600, (18): : 1 - 2
[29] EPITAXIAL GROWTH OF CdTe ON InSb(100) BY RF SPUTTERING.
Nishibayashi, Yoshiki
Imura, Takeshi
Osaka, Yukio
Japanese Journal of Applied Physics, Part 2: Letters, 1987, 26 (09): : 1437 - 1439
[30] InSb-MAOS STRUCTURE FABRICATED BY ANODIZATION AND SPUTTERING.
Fujisada, Hiroyuki
1600, (26):

← 1 2 3 4 5 →