Properties of palladium silicide thin films obtained by vacuum rapid thermal annealing of r.f. sputtered Pd films on Si

被引：0
|
作者：
Bulgarian Acad of Sciences, Sofia, Bulgaria [1 ]
机构：
来源：
Vacuum | / 2卷 / 177-180期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Fabrication of Polycrystalline Si Films by Silicide-Enhanced Rapid Thermal Annealing and Their Application to Thin Film Transistors
    Kim, Jone Soo
    Moon, Sun Hong
    Yang, Yong Ho
    Yang, Yong Ho
    Kang, Sung Mo
    Ahn, Byung Tae
    KOREAN JOURNAL OF MATERIALS RESEARCH, 2014, 24 (09): : 443 - 450
  • [32] Characterization of r.f. sputtered thin Mo, W and Si films as precursors to multilayer X-ray mirrors
    Bhattacharyya, D.
    Joseph, D.
    Poswal, A. K.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 248 (02): : 264 - 272
  • [33] Silicon Effect on the Hardness of r.f. Sputtered B-C:Si Amorphous Films
    Louro, Cristina
    Oliveira, Joao C.
    Chhowalla, Manish
    Cavaleiro, Albano
    PLASMA PROCESSES AND POLYMERS, 2009, 6 : S141 - S145
  • [34] TRANSIENT THERMAL ANNEALING OF CO-SPUTTERED TANTALUM SILICIDE FILMS
    KWONG, DL
    KWOR, R
    ARAUJO, C
    JONES, RE
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (08) : C325 - C325
  • [35] OXYGEN IMPURITY EFFECTS ON THE FORMATION OF THIN TITANIUM SILICIDE FILMS BY RAPID THERMAL ANNEALING
    HEINTZE, M
    CATANA, A
    SCHMID, PE
    LEVY, F
    STADELMANN, P
    WEISS, P
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1990, 23 (08) : 1076 - 1081
  • [36] INFLUENCE OF RAPID THERMAL ANNEALING PARAMETERS ON PROPERTIES OF YBACUO THIN-FILMS SPUTTERED ON POLYCRYSTALLINE ZIRCONIA
    BAIXERAS, J
    CARRIE, F
    TEHERANI, FH
    KREISLER, A
    JOURNAL OF THE LESS-COMMON METALS, 1990, 164 : 366 - 373
  • [37] Influence of rapid-thermal-annealing temperature on properties of rf-sputtered SnOx thin films
    Jiang, Yu-Hao
    Chiu, I-Chung
    Kao, Peng-Kai
    He, Jyun-Ci
    Wu, Yu-Han
    Yang, Yao-Jhen
    Hsu, Cheng-Che
    Cheng, I-Chun
    Chen, Jian-Zhang
    APPLIED SURFACE SCIENCE, 2015, 327 : 358 - 363
  • [38] Effect of rapid thermal annealing on the properties of thin carbon films
    Beshkov, G
    Velchev, N
    Tzenov, N
    Milenov, T
    Lazarova, V
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1996, 38 (1-2): : 25 - 28
  • [39] R.F. magnetron sputtered WTi and WTi-N thin films as diffusion barriers between Cu and Si.
    Laboratoire des Plasmas et des Couches Minces, IMN, 2 rue de la Houssinière, 44322 Nantes Cedex 3, France
    Vide: Science, Technique et Applications, 1997, 53 (283 SUPPL.): : 122 - 123
  • [40] DIELECTRIC-PROPERTIES OF GERMANIUM-LEAD-OXYGEN THIN-FILMS OBTAINED BY R.F. SPUTTERING
    CAPERAA, C
    BAUD, G
    BESSE, JP
    JACQUET, M
    MATERIALS RESEARCH BULLETIN, 1993, 28 (03) : 203 - 212
12345