Effects of r.f. power on optical and electrical properties of plasma-deposited hydrogenated amorphous silicon thin films

被引：0
|
作者：
Andujar, J.L. [1 ]
Kasaneva, J. [1 ]
Serra, J. [1 ]
Canillas, A. [1 ]
Roch, C. [1 ]
Morenza, J.L. [1 ]
Bertran, E. [1 ]
机构：
[1] Universitat de Barcelona, Barcelona, Spain
来源：
Sensors and Actuators, A: Physical | 1993年 / 37-38卷 / 02期
关键词：
Fourier transform infrared absorption spectroscopy - Hydrogenated amorphous silicon thin films - Ion bombardment mechanics - Photoelectrical conductivity measurements - Photothermal deflection spectroscopy - Plasma polymerization - Radio frequency plasma deposition - Spectroellipsometry;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：733 / 736
相关论文
共 50 条
  • [21] Initiation of corrosion in metal substrates coated with plasma-deposited hydrogenated amorphous silicon alloy ceramic thin films
    Hihara, LH
    Iwane, A
    Voss, S
    Rocheleau, RE
    CORROSION SCIENCE, 1999, 41 (07) : 1403 - 1417
  • [22] Effects of substrate temperature on electrical and optical properties ITO films deposited by r.f. magnetron sputtering
    Lee, Jae-Hyeong
    JOURNAL OF ELECTROCERAMICS, 2009, 23 (2-4) : 554 - 558
  • [23] Structural, optical and electrical properties of V doped ZnO thin films deposited by r.f. magnetron sputtering
    Lovchinov, K.
    Nichev, H.
    Angelov, O.
    Sendova-Vassileva, M.
    Mikli, V.
    Dimova-Malinovska, D.
    16 ISCMP: PROGRESS IN SOLID STATE AND MOLECULAR ELECTRONICS, IONICS AND PHOTONICS, 2010, 253
  • [24] Hydrogen bonding in plasma-deposited amorphous hydrogenated boron films
    Sass, M
    Annen, A
    Jacob, W
    JOURNAL OF APPLIED PHYSICS, 1997, 82 (04) : 1905 - 1908
  • [25] Hydrogen bonding in plasma-deposited amorphous hydrogenated boron films
    J Appl Phys, 4 (1905):
  • [26] Optical and electrical properties of R.F. magnetron sputtered ZnO:Al thin films
    Dimova-Malinovska, D.
    Tzenov, N.
    Tzolov, M.
    Vassilev, L.
    Materials science & engineering. B, Solid-state materials for advanced technology, 1998, B52 (01): : 59 - 62
  • [27] THE PRESENCE OF SILANE GAS IN PLASMA-DEPOSITED HYDROGENATED AMORPHOUS-SILICON
    BEKKAY, T
    IZQUIERDO, R
    STDENIS, M
    SACHER, E
    YELON, A
    SURFACE SCIENCE, 1989, 222 (2-3) : L831 - L836
  • [28] Optical Properties of Hydrogenated Amorphous Silicon Thin Film Deposited by PECVD
    Li, Yingge
    Du, Dongxing
    2010 INTERNATIONAL CONFERENCE ON INFORMATION, ELECTRONIC AND COMPUTER SCIENCE, VOLS 1-3, 2010, : 788 - +
  • [29] Effect of microwave pulse on the optical properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance plasma
    Lee, JH
    Jung, IC
    Park, SK
    Baek, CA
    Park, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (11): : 6867 - 6870
  • [30] Optical properties of amorphous hydrogenated silicon nitride thin films
    Perez, Arllene M.
    Santiago, Cesar
    Renero, Francisco
    Zuniga, Carlos
    OPTICAL ENGINEERING, 2006, 45 (12)
12345