Effects of r.f. power on optical and electrical properties of plasma-deposited hydrogenated amorphous silicon thin films

被引：0
|
作者：
Andujar, J.L. [1 ]
Kasaneva, J. [1 ]
Serra, J. [1 ]
Canillas, A. [1 ]
Roch, C. [1 ]
Morenza, J.L. [1 ]
Bertran, E. [1 ]
机构：
[1] Universitat de Barcelona, Barcelona, Spain
来源：
Sensors and Actuators, A: Physical | 1993年 / 37-38卷 / 02期
关键词：
Fourier transform infrared absorption spectroscopy - Hydrogenated amorphous silicon thin films - Ion bombardment mechanics - Photoelectrical conductivity measurements - Photothermal deflection spectroscopy - Plasma polymerization - Radio frequency plasma deposition - Spectroellipsometry;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：733 / 736
相关论文
共 50 条
  • [1] EFFECTS OF RF POWER ON OPTICAL AND ELECTRICAL-PROPERTIES OF PLASMA-DEPOSITED HYDROGENATED AMORPHOUS-SILICON THIN-FILMS
    ANDUJAR, JL
    KASANEVA, J
    SERRA, J
    CANILLAS, A
    ROCH, C
    MORENZA, JL
    BERTRAN, E
    SENSORS AND ACTUATORS A-PHYSICAL, 1993, 37-8 : 733 - 736
  • [2] Effect of annealing on the electrical, optical and structural properties of hydrogenated amorphous silicon films deposited in an asymmetric R.F. plasma CVD system at room temperature
    Panwar, O.S.
    Mukherjee, C.
    Bhattacharyya, R.
    Solar Energy Materials and Solar Cells, 1999, 56 (04): : 373 - 391
  • [3] Structural and optical properties of plasma-deposited amorphous hydrogenated oxygenated carbon films
    Durrant, SF
    deOliveira, RT
    Castro, SGC
    BolivarMarinez, LE
    Galvao, DS
    deMoraes, MAB
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1997, 15 (03): : 1334 - 1339
  • [4] ELECTRICAL AND OPTICAL-PROPERTIES OF PLASMA-DEPOSITED AMORPHOUS HYDROCARBON FILMS
    ROHWER, K
    HAMMER, P
    THIELE, JU
    GISSLER, W
    BLAUDECK, P
    FRAUENHEIM, T
    MEISSNER, D
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 : 843 - 846
  • [5] ELECTRICAL CHARACTERIZATION OF PLASMA-DEPOSITED HYDROGENATED AMORPHOUS-CARBON FILMS
    HAMMER, P
    HELMBOLD, A
    ROHWER, KC
    MEISSNER, D
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 (1-2): : 334 - 338
  • [6] Effects of phosphorus on the electrical characteristics of plasma deposited hydrogenated amorphous silicon carbide thin films
    Alcinkaya, Burak
    Sel, Kivanc
    SOLID-STATE ELECTRONICS, 2018, 139 : 109 - 114
  • [7] Spectroscopic second harmonic generation measured on plasma-deposited hydrogenated amorphous silicon thin films
    Kessels, WMM
    Gielis, JJH
    Aarts, IMP
    Leewis, CM
    van de Sanden, MCM
    APPLIED PHYSICS LETTERS, 2004, 85 (18) : 4049 - 4051
  • [8] OPTICAL, ELECTRICAL AND STRUCTURAL-PROPERTIES OF PLASMA-DEPOSITED AMORPHOUS-SILICON
    TANAKA, K
    NAKAGAWA, K
    MATSUDA, A
    MATSUMURA, M
    YAMAMOTO, H
    YAMASAKI, S
    OKUSHI, H
    IIZIMA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) : 267 - 273
  • [9] Effects of gas pressure and r.f. power on the growth and properties of magnetron sputter deposited amorphous carbon thin films
    Andújar, JL
    Pino, E
    Polo, MC
    Pinyol, A
    Corbella, C
    Bertran, E
    DIAMOND AND RELATED MATERIALS, 2002, 11 (3-6) : 1005 - 1009
  • [10] Silicon hydride composition of plasma-deposited hydrogenated amorphous and nanocrystalline silicon films and surfaces
    Marra, DC
    Edelberg, EA
    Naone, RL
    Aydil, ES
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (06): : 3199 - 3210
12345