Large-area quartz glass microlens array fabricated by ion beam etching for focal plane detectors

被引:0
|
作者
Zhang, Xinyu [1 ]
Yi, Xinjian [1 ]
He, Miao [1 ]
Zhao, Xingrong [1 ]
机构
[1] Huazhong Univ of Science and, Technology, Wuhan, China
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
(Edited Abstract)
引用
收藏
页码:97 / 101
相关论文
共 50 条
  • [31] Large-area micro/nanostructures fabrication in quartz by laser interference lithography and dry etching
    C. H. Liu
    M. H. Hong
    M. C. Lum
    H. Flotow
    F. Ghadessy
    J. B. Zhang
    Applied Physics A, 2010, 101 : 237 - 241
  • [32] Large-area micro/nanostructures fabrication in quartz by laser interference lithography and dry etching
    Liu, C. H.
    Hong, M. H.
    Lum, M. C.
    Flotow, H.
    Ghadessy, F.
    Zhang, J. B.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2010, 101 (02): : 237 - 241
  • [33] ION-IMPLANTATION FOR LARGE-AREA OPTOELECTRONICS ON GLASS SUBSTRATES
    TANAKA, S
    TAGAMI, T
    YAMAOKA, T
    OYOSHI, K
    ARIMA, Y
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 74 (1-2): : 317 - 321
  • [34] Large-scale high quality glass microlens arrays fabricated by laser enhanced wet etching
    Tong, Siyu
    Bian, Hao
    Yang, Qing
    Chen, Feng
    Deng, Zefang
    Si, Jinhai
    Hou, Xun
    OPTICS EXPRESS, 2014, 22 (23): : 29283 - 29291
  • [35] Improved durability of dielectric coatings for large-area applications on glass via ion beam pretreatment of the substrate
    West, GT
    Kelly, PJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (02): : 334 - 339
  • [36] Inductively coupled plasma etching for large format HgCdTe focal plane array fabrication
    Smith, EPG
    Venzor, GM
    Newton, MD
    Liguori, MV
    Gleason, JK
    Bornfreund, RE
    Johnson, SM
    Benson, JD
    Stoltz, AJ
    Varesi, JB
    Dinan, JH
    Radford, WA
    JOURNAL OF ELECTRONIC MATERIALS, 2005, 34 (06) : 746 - 753
  • [37] Inductively coupled plasma etching for large format HgCdTe focal plane array fabrication
    E. P. G. Smith
    G. M. Venzor
    M. D. Newton
    M. V. Liguori
    J. K. Gleason
    R. E. Bornfreund
    S. M. Johnson
    J. D. Benson
    A. J. Stoltz
    J. B. Varesi
    J. H. Dinan
    W. A. Radford
    Journal of Electronic Materials, 2005, 34 : 746 - 753
  • [38] Microscopic evaluation of the absolute fluence distribution of a large-area uniform ion beam using the track-etching technique
    Kitamura , Akane
    Yamaki, Tetsuya
    Yuri, Yosuke
    Sawada, Shin-ichi
    Yuyama, Takahiro
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2013, 314 : 47 - 50
  • [39] Fabrication of large-area cylindrical microlens array based on electric-field-driven jet printing
    Yujie Hu
    Xiaoyang Zhu
    Hongke Li
    Lei Qian
    Jianjun Yang
    Hongbo Lan
    Microsystem Technologies, 2019, 25 : 4495 - 4503
  • [40] Fabrication of large-area cylindrical microlens array based on electric-field-driven jet printing
    Hu, Yujie
    Zhu, Xiaoyang
    Li, Hongke
    Qian, Lei
    Yang, Jianjun
    Lan, Hongbo
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2019, 25 (12): : 4495 - 4503