MOCVD of SnO2 thin films from a new organometallic precursor

被引：0
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作者：
Barreca, D. [1 ]
Garon, S. [2 ]
Zanella, P. [2 ]
Tondello, E. [1 ]
机构：
[1] Dipto. Chim. Inorg., M., Ctro. Stud. Stabilite Reattivita C., Universitè di Padova, via Marzolo 1, 35131 Padova, Italy
[2] Ist. Chim. Tecnologie Inorganiche M., corso Stati Uniti 4, 35127 Padova, Italy
来源：
Journal De Physique. IV : JP | 1999年 / 9 pt 2卷 / 08期
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页码：8 / 667
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