Ultrathin resist pattern transfer process by filling mask material in the resist pattern

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[1] Kato, Hirokazu
[2] Matsunaga, Kentaro
[3] Abe, Junko
[4] Onishi, Yasunobu
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Kato, H. (hir-kato@amc.toshiba.co.jp) | 1600年 / Japan Society of Applied Physics卷 / 42期
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