Freeze-drying process to avoid resist pattern collapse

被引：0
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作者：
Tanaka, Toshihiko [1 ]
Morigami, Mitsuaki [1 ]
Oizumi, Hiroaki [1 ]
Ogawa, Taro [1 ]
机构：
[1] Hitachi Ltd, Tokyo, Japan
来源：
| 1600年 / 32期
关键词：
Photolithography;
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