Production of carbon clusters using plasma chemical vapor deposition in He/CH4 glow discharge

被引：0
|
作者：
Sasaki, Suguru [1 ]
Kitagawa, Nobuhiko [1 ]
Takada, Noriharu [1 ]
Nagatsu, Masaaki [1 ]
机构：
[1] Nagoya Univ, Nagoya, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1997年 / 36卷 / 12 A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：7399 / 7403
相关论文
共 50 条
  • [1] Production of carbon clusters using plasma chemical vapor deposition in He/CH4 glow discharge
    Sasaki, S
    Kitagawa, N
    Takada, N
    Nagatsu, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (12A): : 7399 - 7403
  • [2] Growth of carbon nanotubes by microwave plasma chemical vapor deposition using CH4 and CO2
    Chen, M
    Chen, CM
    Chen, CF
    THIN SOLID FILMS, 2002, 420 : 230 - 234
  • [3] Size and flux of carbon nanoparticles synthesized by Ar + CH4 multi-hollow plasma chemical vapor deposition
    Hwang, Sung-Hwa
    Okumura, Takamasa
    Kamataki, Kunihiro
    Itagaki, Naho
    Koga, Kazunori
    Shiratani, Masaharu
    DIAMOND AND RELATED MATERIALS, 2020, 109
  • [4] Understanding growth of carbon nanowalls at atmospheric pressure using normal glow discharge plasma-enhanced chemical vapor deposition
    Bo, Zheng
    Yu, Kehan
    Lu, Ganhua
    Wang, Pengxiang
    Mao, Shun
    Chen, Junhong
    CARBON, 2011, 49 (06) : 1849 - 1858
  • [5] Catalyzed growth model of carbon nanotubes by microwave plasma chemical vapor deposition using CH4 and CO2 gas mixtures
    Chen, M
    Chen, CM
    Koo, HS
    Chen, CF
    DIAMOND AND RELATED MATERIALS, 2003, 12 (10-11) : 1829 - 1835
  • [6] DEPOSITION MECHANISM OF HYDROGENATED HARD-CARBON FILMS IN A CH4 RF DISCHARGE PLASMA
    MUTSUKURA, N
    INOUE, S
    MACHI, Y
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (01) : 43 - 53
  • [7] Audio-frequency glow discharge for plasma chemical vapor deposition from organic compounds of the carbon family
    Tyczkowski, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1999, 17 (02): : 470 - 479
  • [8] Synthesis of Carbon Nanotubes by Chemical Vapor Deposition and their Application for CO2 and CH4 Detection
    Firouzi, Amin
    Sobri, Shafreeza
    Yasin, Faizah Mohd
    Ahmadun, Fakhru'l-razi B.
    NANOTECHNOLOGY AND BIOSENSORS, 2011, : 169 - 172
  • [9] DIAMOND FILM DEPOSITION BY DOWNSTREAM DC GLOW-DISCHARGE PLASMA CHEMICAL-VAPOR-DEPOSITION
    POLUSHKIN, VM
    POLYAKOV, SN
    RAKHIMOV, AT
    SUETIN, NV
    TIMOFEYEV, MA
    TUGAREV, VA
    DIAMOND AND RELATED MATERIALS, 1994, 3 (4-6) : 531 - 533
  • [10] Characterization of clarbon nitride deposition from CH4/N2 glow discharge plasma beams using optical emission spectroscopy
    Hu, Wei
    Tang, Jun-Yi
    Wu, Jia-da
    Sun, Jian
    Shen, Yi-qun
    Xu, Xiao-feng
    Xu, Ning
    PHYSICS OF PLASMAS, 2008, 15 (07)
12345