Backgating from adjacent contact pads is a major source of crosstalk plaguing GaAs MESFET integrated circuits. The backgating is primarily caused by conduction in the buffer layer between the n-GaAs layer and the substrate. In circuits containing LEDs or lasers, crosstalk can also be caused through optical excitation. A buffer layer which is electrically insulating ( rho greater than 10**1**7 OMEGA -cm), completely optically inactive, and on which high-quality GaAs can be grown, has been grown by molecular-beam epitaxy (MBE). This layer, used in GaAs MESFET circuits, was found to eliminate both electrical and optical crosstalk and to improve device breakdown voltages significantly.
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Waseda Univ, Dept Elect Engn & Biosci, Tokyo, Japan
Waseda Univ, Kagami Mem Res Inst Mat Sci & Technol, Tokyo, JapanWaseda Univ, Dept Elect Engn & Biosci, Tokyo, Japan
Kobayashi, M.
Nan, S.
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Waseda Univ, Dept Elect Engn & Biosci, Tokyo, JapanWaseda Univ, Dept Elect Engn & Biosci, Tokyo, Japan