Hydrogen and oxygen plasma effects on polycrystalline silicon thin films of various thicknesses

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作者：
Liou, Bor Wen [1 ]
Lee, Chung Len [1 ]
Lei, Tan Fu [1 ]
Wu, Yi Huang [1 ]
机构：
[1] Natl Chiao Tung Univ, Hsinchu, Taiwan
来源：
| 1997年 / JJAP, Tokyo, Japan卷 / 36期
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