Hydrogen and oxygen plasma effects on undoped and n-p compensation-doped single- and multilayer polycrystalline silicon resistor films

被引：0

|

作者：

Liou, Bor Wen ^{[1
,2
]}

Chang, Shu Cheng ^{[3
]}

Wang, Shui Jinn ^{[3
]}

机构：

[1] Department of Computer Science and Information Engineering, Wufeng Institute of Technology, Chiayi 621, Taiwan

[2] Department of Applied Physics, Institute of Optoelectronics and Solid State Electronics, National Chiayi University, Chiayi 600, Taiwan

[3] Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2005年 / 44卷 / 5 A期

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摘要：

21

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页码：2929 / 2935

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