Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures

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|
作者：
Minhas, Babar K. [1 ]
Coulombe, Stephen A. [1 ]
Naqvi, S. Sohail H. [1 ,2 ]
McNeil, John R. [1 ]
机构：
[1] Center for High Technology Materials, University of New Mexico, Albuquerque, NM 87131, United States
[2] GIK Inst. of Eng. Sci. and Technol., Pakistan
来源：
Applied Optics | 1998年 / 37卷 / 22期
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页码：5112 / 5115
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