Mev-ENERGY B + , P + AND As + ION IMPLANTATION INTO Si.

被引：0
|
作者：
Tamura, M. [1 ]
Natsuaki, N. [1 ]
Wada, Y. [1 ]
Mitani, E. [1 ]
机构：
[1] Hitachi Ltd, Tokyo, Jpn, Hitachi Ltd, Tokyo, Jpn
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期
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摘要：
24
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页码：438 / 446
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