Thin CoSi2 formation on SiO2 with low-energy ion irradiation

被引：0
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作者：
Matsushita, Atsushi [1 ]
Sadoh, Taizoh [1 ]
Tsurushima, Toshio [1 ]
机构：
[1] Kyushu Univ, Fukuoka, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1998年 / 37卷 / 11期
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页码：6117 / 6122
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