Plasma treatment and dry etch characteristics of organic low-k dielectrics

被引：0

作者：

Wei, Ta-Chin ^{[1
]}

Liu, Chi-Hung ^{[1
]}

Shieh, Jia-Ming ^{[1
]}

Suen, Shich-Chang ^{[1
]}

Dai, Bau-Tong ^{[1
]}

机构：

[1] Chung Yuan Univ, Chung Li, Taiwan

来源：

| 2000年 / 39期

关键词：

Helicon-wave high-density oxygen plasmas;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

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