Plasma treatment and dry etch characteristics of organic low-k dielectrics

被引：0
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作者：
Wei, Ta-Chin [1 ]
Liu, Chi-Hung [1 ]
Shieh, Jia-Ming [1 ]
Suen, Shich-Chang [1 ]
Dai, Bau-Tong [1 ]
机构：
[1] Chung Yuan Univ, Chung Li, Taiwan
来源：
| 2000年 / 39期
关键词：
Helicon-wave high-density oxygen plasmas;
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