Investigation on titanium nitride thin films prepared by ion beam enhanced deposition

被引：0
|
作者：
Xiang, Wei [1 ]
Lai, Zuwu [1 ]
Luo, Siwei [1 ]
Fang, Renchang [1 ]
Li, Wenzhi [1 ]
机构：
[1] China Acad of Engineering Physics, Chengdu, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology | 1998年 / 18卷 / 04期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
(Edited Abstract)
引用
收藏
页码：308 / 312
相关论文
共 50 条
  • [41] Zirconium and zirconia thin films prepared on NaCl by ion beam deposition
    Yeh, Sung-Wei
    Hsieh, Tien-Yu
    Mao, Shih-Wei
    Gan, Dershin
    Shen, Pouyan
    MATERIALS CHEMISTRY AND PHYSICS, 2007, 105 (01) : 127 - 135
  • [42] Nanocrystalline titanium nitride films prepared by electrophoretic deposition
    Cui, Xiaoli
    Yu, Zhiyong
    Ma, Ming
    Chu, Paul K.
    SURFACE & COATINGS TECHNOLOGY, 2009, 204 (04): : 418 - 422
  • [43] Blood compatibility of titanium oxide prepared by ion-beam-enhanced deposition
    Zhang, F
    Huang, N
    Yang, P
    Zeng, XL
    Mao, YJ
    Zheng, ZH
    Zhou, ZY
    Liu, XH
    SURFACE & COATINGS TECHNOLOGY, 1996, 84 (1-3): : 476 - 479
  • [44] Blood compatibility of titanium oxide prepared by ion-beam-enhanced deposition
    Zhang, Feng
    Huang, Nan
    Yang, Ping
    Zeng, Xiaolan
    Mao, Yingjun
    Zheng, Zhihong
    Zhou, Zhuyao
    Liu, Xianghuai
    Surface and Coatings Technology, 1996, 84 (1 -3 pt 2): : 476 - 479
  • [45] Characterization of carbon nitride thin films prepared by dual ion beam sputtering
    Fernandez, A
    Prieto, P
    Quiros, C
    Sanz, JM
    Martin, JM
    Vacher, B
    APPLIED PHYSICS LETTERS, 1996, 69 (06) : 764 - 766
  • [46] The characterization of aluminum nitride thin films prepared by dual ion beam sputtering
    Chen, HY
    Han, S
    Shih, HC
    SURFACE & COATINGS TECHNOLOGY, 2006, 200 (10): : 3326 - 3329
  • [47] Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
    Eun-Young Yun
    Woo-Jae Lee
    Qi Min Wang
    Se-Hun Kwon
    Journal of Materials Science & Technology, 2017, 33 (03) : 295 - 299
  • [48] Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
    Yun, Eun-Young
    Lee, Woo-Jae
    Wang, Qi Min
    Kwon, Se-Hun
    JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 2017, 33 (03) : 295 - 299
  • [49] Tribological properties of titanium nitride films prepared by dynamic ion beam mixing method
    Nagasaka, H.
    Chayahara, A.
    Fujii, K.
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1997, 121 (1-4): : 279 - 282
  • [50] Tribological properties of titanium nitride films prepared by dynamic ion beam mixing method
    Nagasaka, H
    Chayahara, A
    Fujii, K
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 121 (1-4): : 279 - 282
12345