PHASE RELATION OF Ta-N SYSTEM.

被引:0
|
作者
Koyama, Takashi [1 ]
Kieda, Nobuo [1 ]
Uematsu, Keizo [1 ]
Mizutatni, Noboyasu [1 ]
Kato, Masanori [1 ]
机构
[1] Tokyo Inst of Technology, Dep of, Inorganic Materials, Tokyo, Jpn, Tokyo Inst of Technology, Dep of Inorganic Materials, Tokyo, Jpn
来源
| 1984年 / 92期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
11
引用
收藏
相关论文
共 50 条
  • [31] Structure, phase evolution, and mechanical properties of DC, pulsed DC, and high power impulse magnetron sputtered Ta-N films
    Koller, C. M.
    Marihart, H.
    Bolvardi, H.
    Kolozsvari, S.
    Mayrhofer, P. H.
    SURFACE & COATINGS TECHNOLOGY, 2018, 347 : 304 - 312
  • [32] Zr层插入对Ta-N扩散阻挡性能的影响
    丁明惠
    张丽丽
    盖登宇
    王颖
    稀有金属材料与工程, 2009, 38 (11) : 2036 - 2038
  • [33] Influence of Sputtering Target Power on Microstructure and Mechanical Properties of W-N and Ta-N Coatings
    Yang, J. F.
    Prakash, B.
    Yuan, Z. G.
    Jiang, Y.
    Wang, X. P.
    Fang, Q. F.
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2012, 4 (06) : 604 - 608
  • [34] Mechanical and Tribological Properties of Ta-N and Ta-Al-N Coatings Deposited by Reactive High Power Impulse Magnetron Sputtering
    Zin, Valentina
    Montagner, Francesco
    Deambrosis, Silvia Maria
    Mortalo, Cecilia
    Litti, Lucio
    Meneghetti, Moreno
    Miorin, Enrico
    MATERIALS, 2022, 15 (09)
  • [35] 不同氮流量比制备纳米Ta-N薄膜及其性能
    李幼真
    周继承
    陈海波
    黄迪辉
    刘正
    功能材料与器件学报, 2008, (04) : 769 - 774
  • [36] Synthesis and electrochemical characteristics of Ta-N thin films fabricated by cathodic arc deposition
    Li, Li
    Niu, Erwu
    Lv, Guohua
    Zhang, Xianhui
    Chen, Huan
    Fan, Songhua
    Liu, Chizi
    Yang, Si-Ze
    APPLIED SURFACE SCIENCE, 2007, 253 (16) : 6811 - 6816
  • [37] Effects of nitrogen partial pressure in Ta-N films grown by the cathodic vacuum arc technique
    Li, Li
    Lv, GuoHua
    Yang, Si-ze
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (28)
  • [38] Fabrication and characteristics of micromachined Ta-N ceramic thin-film pressure sensors
    Chung, GS
    Nam, CW
    Cho, SB
    Lee, JH
    Lee, KC
    Korus 2005, Proceedings, 2005, : 439 - 443
  • [39] Structure and tribological evolution of Ta-N layer by controlling the time of microwave plasma nitriding
    Li, Jiacheng
    Xu, Zhigang
    Peng, Jian
    Shen, Qiang
    Wang, Chuanbin
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2025, 43 (02):
  • [40] Effect of Thin Zr Layer Insertion on the Ta-N Diffusion Barrier Performance in Cu Metallization
    Ding Minghui
    Zhang Lili
    Gai Dengyu
    Wang Ying
    RARE METAL MATERIALS AND ENGINEERING, 2009, 38 (11) : 2036 - 2038