Coherent islands as preferential sites for sticking of Ge atoms in Si/Ge multilayers: formation of conical shaped defects

被引:0
|
作者
机构
来源
Appl Phys Lett | / 17卷 / 2546期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] SiGe NANOCRYSTAL FORMATION IN PECVD GROWN SiOX/Si/Ge/Si/SiOX MULTILAYERS
    Agan, S.
    Aydinli, A.
    PHYSICS, CHEMISTRY AND APPLICATION OF NANOSTRUCTURES, 2009, : 77 - +
  • [22] Formation of Ge, islands from a Ge layer on Si substrate during post-growth annealing
    Kovacevic, I.
    Pivac, B.
    Dubcek, P.
    Zorc, H.
    Radic, N.
    Bernstorff, S.
    Campione, M.
    Sassella, A.
    APPLIED SURFACE SCIENCE, 2007, 253 (06) : 3034 - 3040
  • [23] Structure and morphology of Ge nanowires on Si (001): Importance of the Ge islands on the growth direction and twin formation
    Boudaa, F.
    Blanchard, N. P.
    Descamps-Mandine, A.
    Benamrouche, A.
    Gendry, M.
    Penuelas, J.
    JOURNAL OF APPLIED PHYSICS, 2015, 117 (05)
  • [24] THE EFFECT OF ION-IMPLANTATION AND SOLUTE ATOMS ON THE INTERDIFFUSION IN AMORPHOUS SI/GE MULTILAYERS
    PARK, B
    SPAEPEN, F
    POATE, JM
    JACOBSON, DC
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (09) : 6430 - 6436
  • [25] Strain relief via trench formation in Ge/Si(100) islands
    Chaparro, SA
    Zhang, Y
    Drucker, J
    APPLIED PHYSICS LETTERS, 2000, 76 (24) : 3534 - 3536
  • [26] Fully coherent Ge islands growth on Si nano-pillars by selective epitaxy
    Yamamoto, Yuji
    Zaumseil, Peter
    Schubert, Markus Andreas
    Capellini, Giovanni
    Salvalaglio, Marco
    Montalenti, F.
    Schroeder, Thomas
    Tillack, Bernd
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2017, 70 : 30 - 37
  • [27] Identification of shape transitions in coherent Ge/Si islands using transmission electron microscopy
    Liu, CP
    Henstrom, WL
    Cahill, DG
    Gibson, JM
    SELF-ORGANIZED PROCESSES IN SEMICONDUCTOR ALLOYS, 2000, 583 : 137 - 142
  • [28] FORMATION AND ANNEALING OF STRUCTURAL DEFECTS IN GE AND SI DURING ION BOMBARDMENT
    ABROYAN, IA
    BELYAKOV, VS
    TSEKHNOV.LA
    IZVESTIYA AKADEMII NAUK SSSR SERIYA FIZICHESKAYA, 1971, 35 (05): : 1080 - +
  • [29] Formation of a Stepped Si(100) Surface and Its Effect on the Growth of Ge Islands
    Esin, M. Yu.
    Nikiforov, A. I.
    Timofeev, V. A.
    Tuktamyshev, A. R.
    Mashanov, V. I.
    Loshkarev, I. D.
    Deryabin, A. S.
    Pchelyakov, O. P.
    SEMICONDUCTORS, 2018, 52 (03) : 390 - 393
  • [30] Towards quantitative understanding of formation and stability of Ge hut islands on Si(001)
    Lu, GH
    Liu, F
    PHYSICAL REVIEW LETTERS, 2005, 94 (17)