Development of SOI high voltage CMOS process for plasma display panel driver ICs

被引：0
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作者：
Kobayashi, Kenya [1 ]
Yanagigawa, Hiroshi [1 ]
Mori, Kazuhisa [1 ]
Yamanaka, Shuichi [1 ]
Fujiwara, Akira [1 ]
机构：
[1] Semiconductor Div
来源：
NEC Research and Development | 1998年 / 39卷 / 04期
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页码：508 / 514
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