Deep-submicron trench profile control using a magnetron enhanced reactive ion etching system for shallow trench isolation

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作者：
Yeon, Chung-Kyu [1 ]
You, Hyuk-Joon [1 ]
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[1] ULSI Laboratory, LG Semicon Co., Ltd., 1, Hyangjeong-dong, Cheongju-si 361-480, Korea, Republic of
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| 1998年 / AVS Science and Technology Society卷 / 16期
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