PREPARATION AND CHARACTERISTICS OF Co-Cr FILMS BY EP MAGNETRON Co-SPUTTERING TECHNIQUE.

被引：0
|
作者：
Takahashi, T. [1 ]
Miyata, T. [1 ]
Yoshida, J. [1 ]
机构：
[1] Toyama Univ, Jpn, Toyama Univ, Jpn
来源：
IEEE translation journal on magnetics in Japan | 1985年 / TJMJ-2卷 / 02期
关键词：
COBALT-CHROMIUM FILMS - EXPOSED-POLE MAGNETRON;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Experimental results are given on high-rate low-temperature deposition of Co-Cr films. The authors use an exposed-pole (EP) magnetron simultaneous sputtering system developed for deposition of ferromagnetic binary alloy films. A composite target consisting of a Co washer, a Cr cylinder, and a Co disk is prepared; the performance of the sputtering system is examined and the film quality evaluated.
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页码：99 / 105
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