Characteristics of material for photoresist spin coating: Property for reduction of photoresist consumption

被引：0
|
作者：
Sanada, Masakazu [1 ]
Nakano, Kayoko [1 ]
Matsunaga, Minobu [1 ]
机构：
[1] Dainippon Screen Mfg. Co Ltd, Kyoto, Japan
来源：
| 1998年 / JJAP, Tokyo, Japan卷 / 37期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] The effect of adding plasticizer into coating photoresist to improve the high speed coating
    Takahashi, S.
    Shimakura, J.
    Kurihara, S.
    IDW '06: PROCEEDINGS OF THE 13TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 2006, : 889 - +
  • [42] Synthesis and photoresist property of a polyamide containing a naphthylurea moiety
    Akimoto, S
    Jikei, M
    Kakimoto, M
    HIGH PERFORMANCE POLYMERS, 1998, 10 (01) : 61 - 68
  • [43] Optimization of spray coating photoresist for high topography surfaces
    Lee, Yom Yeow
    Yu, Liming
    Tay, Francis E. H.
    Iliescu, Ciprian
    CAS 2005: INTERNATIONAL SEMICONDUCTOR CONFERENCE, 2005, 1-2 : 171 - 174
  • [44] Noise reduction in the recording of holographic masks in photoresist
    Cescato, L
    Soares, LL
    Rigon, EL
    Alves, MAR
    Braga, ES
    MICROMACHINE TECHNOLOGY FOR DIFFRACTIVE AND HOLOGRAPHIC OPTICS, 1999, 3879 : 214 - 222
  • [45] Advanced Coating Techniques for Photoresist TEM Sample Preparation
    Sebastian, Elizabeth
    Tee, Irene
    Shen, Yiqiang
    Lee, Kok Wah
    Tam, Lai Kuan
    Zhu, Jie
    Zhao, Siping
    PROCEEDINGS OF THE 2016 IEEE 23RD INTERNATIONAL SYMPOSIUM ON THE PHYSICAL AND FAILURE ANALYSIS OF INTEGRATED CIRCUITS (IPFA), 2016, : 112 - 115
  • [46] DECREASE IN PINHOLE DENSITY BY IMPROVING PHOTORESIST COATING CONDITIONS
    MIMURA, Y
    REVIEW OF THE ELECTRICAL COMMUNICATIONS LABORATORIES, 1972, 20 (5-6): : 542 - &
  • [47] Effect of anion in developer on dissolution characteristics of photoresist
    Yamaguchi, Atsumi, 1600, (30):
  • [48] CHARACTERISTICS OF ADHESION BETWEEN PHOTORESIST AND INORGANIC SUBSTRATE
    NAGATA, H
    KAWAI, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (10): : 2137 - 2141
  • [49] Model of spin-coating photoresist-layer thickness on spherical surface and its experimental verification
    Chen, Long-Jiang
    Luo, Jian-Bo
    Liang, Yi-Yong
    Zhang, Chun-Hui
    Yang, Guo-Guang
    Guangdianzi Jiguang/Journal of Optoelectronics Laser, 2009, 20 (04): : 470 - 474
  • [50] VIBRATION ETCHING, A METHOD OF EVALUATION OF PHOTORESIST CHARACTERISTICS
    KOLF, G
    LAESSIG, W
    POLYMER ENGINEERING AND SCIENCE, 1971, 11 (06): : 492 - &
12345