PROTECTIVE COVER FOR THE ANODE OF A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION TOOL.

被引：0
|
作者：
Anon
机构：
来源：
IBM technical disclosure bulletin | 1985年 / 27卷 / 10 A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
PROTECTIVE COATINGS
引用
收藏
页码：5666 / 5667
相关论文
共 50 条
  • [41] THE DEPOSITION RATE AND PROPERTIES OF THE DEPOSIT IN PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION OF TIN
    JANG, DH
    CHUN, JS
    KIM, JG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (01): : 31 - 35
  • [42] CHEMICAL VAPOR-DEPOSITION OF ALUMINUM ENHANCED BY MAGNETRON-PLASMA
    KATO, T
    ITO, T
    MAEDA, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (02) : 455 - 459
  • [43] Plasma-enhanced chemical vapor deposition of graphene optimized by pressure
    Ma, Chen
    Yu, Hugo
    Yu, Kehan
    MATERIALS RESEARCH EXPRESS, 2019, 6 (10):
  • [44] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE FILMS
    WILLIAMS, LM
    APPLIED PHYSICS LETTERS, 1985, 46 (01) : 43 - 45
  • [45] Carbon nanowalls grown by microwave plasma enhanced chemical vapor deposition
    Wu, YH
    Qiao, PW
    Chong, TC
    Shen, ZX
    ADVANCED MATERIALS, 2002, 14 (01) : 64 - 67
  • [46] THE DEPOSITION OF INSULATORS ON INP USING PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
    JONES, GR
    CAMERON, DC
    IRVING, LD
    WOODWARD, J
    THIN SOLID FILMS, 1981, 80 (1-3) : 241 - 241
  • [47] The power source effect on SiOx coating deposition by plasma enhanced chemical vapor deposition
    Zhang, Junfeng
    Chen, Qiang
    Zhang, Yuefei
    Liu, Fuping
    Liu, Zhongwei
    THIN SOLID FILMS, 2009, 517 (14) : 3850 - 3853
  • [48] THE EFFECT OF OXYGEN IN DIAMOND DEPOSITION BY MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    LIOU, Y
    INSPEKTOR, A
    WEIMER, R
    KNIGHT, D
    MESSIER, R
    JOURNAL OF MATERIALS RESEARCH, 1990, 5 (11) : 2305 - 2312
  • [49] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION OF EPITAXIAL MERCURY TELLURIDE
    WILLIAMS, LM
    LU, PY
    WANG, CH
    PARSEY, JM
    CHU, SNG
    APPLIED PHYSICS LETTERS, 1987, 51 (21) : 1738 - 1740
  • [50] PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF THIN FILMS.
    Ojha, S.M.
    Physics of Thin Films: Advances in Research and Development, 1982, 12 : 237 - 296
12345