PROTECTIVE COVER FOR THE ANODE OF A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION TOOL.

被引:0
|
作者
Anon
机构
来源
IBM technical disclosure bulletin | 1985年 / 27卷 / 10 A期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
PROTECTIVE COATINGS
引用
收藏
页码:5666 / 5667
相关论文
共 50 条
  • [21] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN
    MAHOWALD, MA
    IANNO, NJ
    THIN SOLID FILMS, 1989, 170 (01) : 91 - 97
  • [22] Crystalline GeSn growth by plasma enhanced chemical vapor deposition
    Dou, Wei
    Alharthi, Bader
    Grant, Perry C.
    Grant, Joshua M.
    Mosleh, Aboozar
    Tran, Huong
    Du, Wei
    Mortazavi, Mansour
    Li, Baohua
    Naseem, Hameed
    Yu, Shui-Qing
    OPTICAL MATERIALS EXPRESS, 2018, 8 (10): : 3220 - 3229
  • [23] Application of Plasma Enhanced Chemical Vapor Deposition for Fingerprint Resistance
    Lei WenwenChen QiangQi FengyangYang LizhenLiu ZhongweiWang Zhengduo Beijing Institute of Graphic CommunicationBeijing China
    稀有金属材料与工程, 2012, 41(S1) (S1) : 433 - 438
  • [24] APPLICATIONS OF PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION IN VLSI
    GOROWITZ, B
    GORCZYCA, TB
    SAIA, RJ
    SOLID STATE TECHNOLOGY, 1985, 28 (06) : 197 - 203
  • [25] Growth of graphene on Cu by plasma enhanced chemical vapor deposition
    Terasawa, Tomo-o
    Saiki, Koichiro
    CARBON, 2012, 50 (03) : 869 - 874
  • [26] Foundations of plasma enhanced chemical vapor deposition of functional coatings
    Snyders, R.
    Hegemann, D.
    Thiry, D.
    Zabeida, O.
    Klemberg-Sapieha, J.
    Martinu, L.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2023, 32 (07):
  • [27] Applications of plasma-enhanced metalorganic chemical vapor deposition
    Smaglik, Nathan
    Pokharel, Nikhil
    Ahrenkiel, Phil
    JOURNAL OF CRYSTAL GROWTH, 2020, 535 (535)
  • [28] Plasma-Enhanced Chemical Vapor Deposition of Graphene Nanostructures
    van der Laan, Timothy
    Kumar, Shailesh
    Ostrikova, Kostya
    ADVANCES IN NANODEVICES AND NANOFABRICATION, 2012, : 75 - 98
  • [29] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF COPPER
    AWAYA, N
    ARITA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1991, 30 (08): : 1813 - 1817
  • [30] Application of Plasma Enhanced Chemical Vapor Deposition for Fingerprint Resistance
    Lei Wenwen
    Chen Qiang
    Qi Fengyang
    Yang Lizhen
    Liu Zhongwei
    Wang Zhengduo
    RARE METAL MATERIALS AND ENGINEERING, 2012, 41 : 433 - 438