A new inspection method for phase-shift mask (PSM) on deep-UV inspection light source

被引：0
|
作者：
Advanced LSI Technology Laboratory, Corporate Res. and Devmt. Center, Toshiba Corporation, 1 Komukai-toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan [1 ]
机构：
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2002年 / 41卷 / 6 B期
关键词：
Phase-shift masks (PSM);
D O I：
10.1143/jjap.41.4233
中图分类号：
学科分类号：
摘要：
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页码：4233 / 4237
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