Role of oxygen in metal silicide formation and properties

被引：0
|
作者：
Murarka, S.P. [1 ]
机构：
[1] Ctr. Adv. Interconnect Sci. Technol., Rensselaer Polytechnic Institute, Troy, NY 12180, United States
来源：
Solid State Phenomena | 2000年 / 71卷
关键词：
Silicides;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：119 / 146
相关论文
共 50 条
  • [41] SILICIDE FORMATION
    OTTAVIANI, G
    NOBILI, C
    THIN SOLID FILMS, 1988, 163 : 111 - 121
  • [42] OXYGEN BEHAVIOR DURING TITANIUM SILICIDE FORMATION BY RAPID THERMAL ANNEALING
    PANTEL, R
    LEVY, D
    NICOLAS, D
    PONPON, JP
    JOURNAL OF APPLIED PHYSICS, 1987, 62 (10) : 4319 - 4321
  • [43] INFLUENCE OF OXYGEN ON THE FORMATION OF EPITAXIAL ERBIUM SILICIDE FILM ON [111]SI
    GRIMALDI, MG
    YAN, XS
    SCERRA, G
    RAVESI, S
    SPINELLA, C
    APPLIED PHYSICS LETTERS, 1995, 67 (07) : 974 - 976
  • [44] FORMATION OF TITANIUM SILICIDE DURING RAPID THERMAL ANNEALING - INFLUENCE OF OXYGEN
    RICHTER, F
    BUGIEL, E
    ERZGRABER, HB
    PANKNIN, D
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (02) : 815 - 817
  • [45] Role of the silicon dioxide in formation of higher manganese silicide films
    Kamilov, TS
    Uzokov, AA
    Kabilov, DK
    Ordin, SV
    Klechkovskaya, VV
    Zanaveskina, IS
    TWENTY-SECOND INTERNATIONAL CONFERENCE ON THERMOELECTRICS, PROCEEDINGS ICT '03, 2003, : 388 - 390
  • [46] Role of step roughening in the formation of Ce silicide on Si(111)
    Lee, HG
    Lee, D
    Kim, S
    Hwang, C
    SURFACE SCIENCE, 2005, 579 (2-3) : 116 - 122
  • [47] OXYGEN IMPURITY EFFECTS AT METAL-SILICIDE INTERFACES - FORMATION OF SILICON-OXIDE AND SUBOXIDES IN THE NI-SI SYSTEM
    GRUNTHANER, PJ
    GRUNTHANER, FJ
    SCOTT, DM
    NICOLET, MA
    MAYER, JW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03): : 641 - 648
  • [48] Investigation of the Optical Properties of Ultrathin Films Based on Metal Silicide
    Kerimov E.A.
    Russian Microelectronics, 2023, 52 (02) : 107 - 111
  • [49] MATERIAL REACTION AND SILICIDE FORMATION AT THE REFRACTORY-METAL SILICON INTERFACE
    RUBLOFF, GW
    TROMP, RM
    VANLOENEN, EJ
    APPLIED PHYSICS LETTERS, 1986, 48 (23) : 1600 - 1602
  • [50] Nickel silicide and titanium silicide formation - A comparison
    Bhaskaran, Madhu
    Sriram, Sharath
    Holland, Anthony S.
    du Plessis, Johan
    SMART STRUCTURES, DEVICES, AND SYSTEMS III, 2007, 6414
12345