Low-frequency noise in polycrystalline semiconducting FeSi2 thin films

被引：0
|
作者：
Tassis, D.H. [1 ]
Dimitriadis, C.A. [1 ]
Brini, J. [2 ]
Kamarinos, G. [2 ]
Birbas, A. [3 ]
机构：
[1] Department of Physics, University of Thessaloniki, 54006 Thessaloniki, Greece
[2] LPCS, ENSERG, 23 rue des Martyrs, 38016 Grenoble Cedex, France
[3] Dept. Elec. Eng. and Comp. Technol., Applied Electronics Laboratory, University of Patras, Patras, Greece
来源：
Journal of Applied Physics | 1999年 / 85卷 / 8 I期
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页码：4091 / 4095
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