Determination of acid diffusion in chemical amplification positive deep-UV resists

被引：0
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作者：
Schlegel, Leo [1 ]
Ueno, Takumi [1 ]
Hayashi, Nobuaki [1 ]
Iwayanagi, Takao [1 ]
机构：
[1] Hitachi Ltd, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1991年 / 30卷 / 11 B期
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页码：3132 / 3137
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