REDUCTION LENSES FOR SUBMICRON LITHOGRAPHY.

被引：0
|
作者：
Omata, Takashi
机构：
来源：
| 1600年 / 27期
关键词：
741; Light; Optics and Optical Devices - 745 Printing and Reprography;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] MASK MAKING FOR SYNCHROTRON RADIATION LITHOGRAPHY.
    Ehrfeld, W.
    Glashauser, W.
    Muenchmeyer, D.
    Schelb, W.
    Microelectronic Engineering, 1986, 5 (1-4) : 463 - 470
  • [22] PROXIMITY EFFECT CORRECTION IN EB LITHOGRAPHY.
    Sugiyama, Naoshi
    Saitoh, Kazunori
    Shimizu, Kyozo
    Tarui, Yasuo
    Electronics & communications in Japan, 1979, 62 (10): : 88 - 97
  • [23] GET SUBMICROMETER RESOLUTION WITH OPTICAL LITHOGRAPHY.
    Schoueffel, James A.
    Oldham, William G.
    Research and Development (Barrington, Illinois), 1987, 29 (01): : 92 - 95
  • [24] INSPECTION AND PROCESS CONTROL IN DSW LITHOGRAPHY.
    Dusa, Mircea
    Dragan, Gabriela
    Microelectronic Engineering, 1987, 6 (1-4) : 693 - 697
  • [25] Tunable superhydrophobic surfaces by colloidal lithography.
    Chen, PL
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2003, 226 : U382 - U383
  • [26] Designing materials for cationic graft lithography.
    Johnson, HF
    Ozair, SN
    Winters, KM
    Willson, CG
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U471 - U471
  • [27] A novel approach for defect detection and reduction techniques for submicron lithography
    Orth, JA
    Phan, KA
    Steele, DA
    Young, RYB
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XI, 1997, 3050 : 586 - 601
  • [28] RESIST POSSIBILITIES IN ION BEAM LITHOGRAPHY.
    Macrander, A.
    Barr, D.
    Wagner, A.
    1600, (22):
  • [29] Interfacial cationic graft polymerization lithography.
    Brodsky, CJ
    Willson, CG
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 218 : U658 - U659
  • [30] SCANNING ELECTRON MICROSCOPY AND ELECTRON LITHOGRAPHY.
    Vasichev, B.N.
    1978, 45 (09): : 592 - 596
12345