A novel approach for defect detection and reduction techniques for submicron lithography

被引：0
|
作者：
Orth, JA
Phan, KA
Steele, DA
Young, RYB
机构：
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XI | 1997年 / 3050卷
关键词：
D O I：
10.1117/12.275952
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：586 / 601
页数：16
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