Reliable two-dimensional carrier profiling by scanning spreading resistance microscopy on InP-based devices with fast quantification procedure

被引:0
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作者
Xu, Ming Wei [1 ]
Eyben, Pierre [1 ]
Hantschel, Thomas [3 ]
Vandervorst, Wilfried [2 ]
机构
[1] IMEC, Kapeldreef 75, B3001 Leuven, Belgium
[2] KU Leuven, INSYS, Kard. Mercierlaan 92, B3001 Leuven, Belgium
[3] Palo Alto Research Center, Xerox Corporation, 3333 Coyote Hill Road, Palo Alto, CA 94304, United States
关键词
Atomic force microscopy - Charge carriers - Diffusion - Oxidation;
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摘要
Scanning spreading resistance microscopy (SSRM) proves to be a promising two-dimensional (2-D) carrier profiling tool, particularly for complicated structures. However, its application to InP-based devices has limited quantitative possibility due to the lack of reliable measuring results. This study reveals that this limitation is related to a tip-induced (field-enhanced) oxidation procedure, which is explained by a P-diffusion-limited model. A practical solution for realizing reliable measurement is developed for the first time with excellent results. Furthermore, a fast quantification procedure based on careful constructed calibration is completed.
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页码:1048 / 1054
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