Deposition of thin TiN films by low-power reactive magnetron sputtering

被引：0
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作者：
Mikhal'chuk, P.V. [1 ]
Orlikovsky, A.A. [1 ]
Vasiliev, A.G. [1 ]
Lebedev, O.I. [2 ]
Zakharov, D.N. [2 ]
机构：
[1] Institute of Physics and Technology, Russian Academy of Sciences, Krasikova str., 25A, Moscow 117218, Russia
[2] Inst. of Crystallography, Russian Academy of Sciences, Leninskii pr.50, Moscow 117333, Russia
来源：
Vide: Science, Technique et Applications | 1997年 / 53卷 / 283 SUPPL.期
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页码：143 / 145
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