共 50 条
- [2] CURRENT METALLIZATION ISSUES IN MICROELECTRONIC DEVICES JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 216 - 217
- [6] HIGHLY PHOTOREACTIVE POLYIMIDE PRECURSOR FOR MICROELECTRONIC DEVICES. New Materials & New Processes, 1985, 3 : 123 - 126
- [8] Properties of copper films prepared by chemical vapor deposition for advanced metallization of microelectronic devices J Electrochem Soc, 9 (3248-3254):
- [10] TECHNIQUE FOR PLANARIZATION OF MULTILEVEL METALLIZATION FOR SEMICONDUCTOR DEVICES. RCA technical notes, 1984, (1348):