HIGHLY PHOTOREACTIVE POLYIMIDE PRECURSOR FOR MICROELECTRONIC DEVICES.

被引：0
|
作者：
Kataoka, F. [1 ]
Shoji, F. [1 ]
Makino, D. [1 ]
机构：
[1] Hitachi Ltd, Yokohama, Jpn, Hitachi Ltd, Yokohama, Jpn
来源：
New Materials & New Processes | 1985年 / 3卷
关键词：
MICROELECTRONIC DEVICES - PHOTOPOLYMERS - PHOTOREACTIVE POLYIMIDE PRECURSOR - POLYIMIDE INSULATING LAYERS;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：123 / 126
相关论文
共 50 条
  • [1] THIN ALLOY FILMS FOR METALLIZATION IN MICROELECTRONIC DEVICES.
    Tu, K.N.
    1600, (24):
  • [2] SPECIAL TECHNIQUES FOR THE AUGER ANALYSIS OF MICROELECTRONIC DEVICES.
    Leung, M.S.
    Stupian, G.W.
    Applied Surface Science, 1985, 29 (04) : 435 - 445
  • [3] Controlled polymeric structures for advanced storage and microelectronic devices.
    Hawker, CJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 228 : U367 - U367
  • [4] Photopolymerization of silica-filled composites: Encapsulants for microelectronic devices.
    Scranton, AB
    Baikerikar, KK
    Sipani, V
    Coretsopoulos, CN
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 222 : U329 - U329
  • [5] Dendritic polymers: Synthesis, characterization and application in advanced microelectronic devices.
    Hedrick, JL
    Gast, AP
    Pople, J
    Stancik, CM
    Trollsas, M
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U873 - U873
  • [6] NONDESTRUCTIVE TESTING OF HIGHLY DESTRUCTIVE DEVICES.
    Reiser, Arthur G.
    Machine and tool blue book, 1986, 81 (12):
  • [7] Film Temperature-Sensitive Resistors for Hybrid Microcircuits and Microelectronic Devices.
    Zakharov, V.I.
    Olesk, A.O.
    Sehftel', I.T.
    1600,
  • [8] PHOTOREACTIVE POLYIMIDE PRECURSORS
    RUBNER, R
    KUHN, E
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1977, 174 (SEP): : 25 - 25
  • [9] Use of "dry" CO2-based technologies for the enhanced fabrication of microelectronic devices.
    Denison, GM
    Jones, CA
    DeYoung, J
    Gross, SM
    McClain, J
    Zannoni, LA
    Hicks, E
    Wood, CD
    Boggiano, MK
    Visintin, PM
    Bessel, CA
    Schauer, CK
    DeSimone, JM
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U502 - U502
  • [10] Design of nanoporous polyarylene polymers for use as low-K dielectrics in microelectronic devices.
    Silvis, HC
    Hahnfeld, JL
    Niu, QJ
    Radler, MJ
    Godschalx, JP
    Stokich, TM
    Lyons, JW
    Kalantar, TH
    Hefner, RE
    Yontz, DJ
    Landes, BG
    Ouellette, KB
    Kern, BJ
    Marshall, JG
    Bouck, KJ
    Syverud, K
    Leff, MB
    Bruza, KJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2002, 224 : U506 - U506
12345