Kinetic analysis of the C49-to-C54 phase transformation in TiSi2 thin films by in situ observation

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作者：
Tanaka, H. [1 ]
Hirashita, N. [1 ]
Sinclair, R. [1 ]
机构：
[1] Oki Electric Industry Co Ltd, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1998年 / 37卷 / 08期
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页码：4284 / 4287
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