Defect characterization in 3C-SiC films grown on thin and thick silicon top layers of SIMOX

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作者：
Hong, M.H. [1 ]
Chung, J. [1 ]
Namavar, F. [2 ]
Pirouz, P. [1 ]
机构：
[1] Dept. of Mat. Sci. and Engineering, Case Western Reserve University, 10900 Euclid Ave., Cleveland, OH 44106-7204, United States
[2] Optoelectronic Division, Spire Corporation, One Patriots Park, Bedford, MA 01730, United States
来源：
Materials Science Forum | 2000年 / 338卷
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