DEPENDENCE OF WARPAGE OF CZOCHRALSKI-GROWN SILICON WAFERS ON OXYGEN CONCENTRATION AND ITS APPLICATION TO MOS IMAGE-SENSOR DEVICE.

被引：0
|
作者：
Shimizu, Hirofumi [1 ]
Fujita, Masato [1 ]
Aoshima, Takaaki [1 ]
Sugino, Yuji [1 ]
机构：
[1] Hitachi Ltd, Kofu Branch, Jpn, Hitachi Ltd, Kofu Branch, Jpn
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes | 1986年 / 25卷 / 01期
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摘要：
54
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页码：68 / 74
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