共 50 条
- [6] Stress and electromigration modelling for confined chip level interconnect lines. STRESS INDUCED PHENOMENA IN METALLIZATION - FOURTH INTERNATIONAL WORKSHOP, 1998, (418): : 303 - 314
- [9] Two dimensional simulation of mechanical stress evolution and electromigration in confined aluminum interconnects STRESS INDUCED PHENOMENA IN METALLIZATION - FOURTH INTERNATIONAL WORKSHOP, 1998, (418): : 329 - 334
- [10] Electromigration Simulation for Metal Lines JOURNAL OF ELECTRONIC PACKAGING, 2010, 132 (01) : 0110021 - 0110027